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        <title>Atomic Layer Deposition of copper - If you like sputtering, you'll love this!</title>
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        <description>An explanation and demo of atomic layer deposition (ALD) of copper metal on glass.  Precursors are copper(I) chloride and hydrogen, processed in a hot-wall tube quartz tube furnace. 10 torr operating pressure 500 sccm argon sweep/purge gas constantly flowing 75 sccm CuCl argon pulse gas (17 seconds including flow controller lag) 100 sccm H pulse gas (14 seconds including flow controller lag) 7 second purge time between pulses 100mm quartz tube furnace diameter 415C deposition temperature 350C CuCl evaporation temperature Substrates are mostly borosilicate glass cleaned with RCA clean The "good" samples shown in the video are about 750 cycles (about 9 hours Main ref: https://sci-hub.se/https://doi.org/10.1002/cvde.19970030107 Also helpful: https://sci-hub.se/https://doi.org/10.1063/1.5087759 https://sci-hub.se/10.1149/2.0261501jss https://sci-hub.se/https://doi.org/10.1016/0022-0248(92)90191-K Alicat flow controller manuals (hard to find via website navigation): https://documents.alicat.com/manuals/DOC-MANUAL-MC.pdf https://documents.alicat.com/manuals/old/Gas_Flow_Controller_Manual_rev7.pdf https://documents.alicat.com/Alicat-Serial-Primer.pdf RCA clean: https://en.wikipedia.org/wiki/RCA_clean CuCl synthesis: http://wwwchem.uwimona.edu.jm/lab_manuals/c1901exp35.html Support Applied Science on Patreon: https://www.patreon.com/AppliedScience</description>
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